Adjusting Wetting and Adhesion Characteristics with ALD and MLD, 2014 PLACE Conference

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Atomic and molecular layer deposition (ALD and MLD, respectively) are based on repeated cycles of gas-solid surface reactions. A monolayer of precursor molecules is chemisorbed onto the surface during a single deposition cycle, enabling control of thin film growth in principle down to sub-monolayer resolution. This level of control has made ALD and MLD interesting for various applications.

Author: Mika Vähä-Nissi, Erkki Salo, Jenni Sievänen, Matti Putkonen, Eija Kenttä, and Ali Harlin
Adjusting Wetting and Adhesion Characteristics with ALD and
Adjusting Wetting and Adhesion Characteristics with ALD and MLD, 2014 PLACE Conference

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