On-line Topography Analysis by Photometric Stereo Method – New tools for paper and board makers, PaperCon 2016

Photometric stereo-based techniques have enabled on-line topography analysis of paper or board in astonishingly high resolution. These modern analyzers do not just estimate PPS or other traditional measures, but they provide quite another dimension for topography characterization that no air leak-based-method can offer. At present, photometric stereo techniques are already able to measure, on-line, detailed features of the web surface moving at typical paper and tissue production speeds, that the human eye cannot resolve. Another strength of photometric stereo analysis is its ability to recognize cross or machine directional topographic patterns over a wide wave length region, on-line and accross the whole web. This gives quite new insights into paper or board fine structure, and how topography with different wavelengths is deeply interlinked with other process and web characteristics such as fiber composition, machine concepts, unit processes and numerous process parameters involved.

This paper gives an overview of the potential of on-line topography analysis for paper and board based on the photometric stereo principle. It presents practical results and experiences from some existing applications and trial runs in paper and board mills. New potential applications relating to offset printability are presented. Finally, a new hypothesis on the analysis of coating base web roughness volume is discussed.

TAPPI conference proceedings and presentations, technical papers, and publication articles provide technical and management data and solutions on topics covering the Pulp, Paper, Tissue, Corrugated Packaging, Flexible Packaging, Nanotechnology and Converting Industries.

Simply select the quantity, add to your cart and your conference paper, presentation or article will be available for immediate download.